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Information card for entry 4124831
Preview
| Coordinates | 4124831.cif | 
|---|---|
| Original paper (by DOI) | HTML | 
| Chemical name | 5,14-di(t-butyldimethylsilylethynyl)dibenzo[a,m]rubicene | 
|---|---|
| Formula | C50 H46 Si2 | 
| Calculated formula | C50 H46 Si2 | 
| SMILES | C[Si](C)(C(C)(C)C)C#Cc1c2ccccc2c2c3c4ccccc4c4c(C#C[Si](C)(C)C(C)(C)C)c5ccccc5c(c5c6ccccc6c1c25)c34 | 
| Title of publication | Synthesis, Molecular Packing, and Thin Film Transistors of Dibenzo[a,m]rubicenes. | 
| Authors of publication | Gu, Xiao; Xu, Xiaomin; Li, Huiyan; Liu, Zhifeng; Miao, Qian | 
| Journal of publication | Journal of the American Chemical Society | 
| Year of publication | 2015 | 
| Journal volume | 137 | 
| Journal issue | 51 | 
| Pages of publication | 16203 - 16208 | 
| a | 21.236 ± 0.004 Å | 
| b | 24.857 ± 0.005 Å | 
| c | 7.6161 ± 0.0014 Å | 
| α | 90° | 
| β | 90° | 
| γ | 90° | 
| Cell volume | 4020.3 ± 1.3 Å3 | 
| Cell temperature | 296 ± 2 K | 
| Ambient diffraction temperature | 296 ± 2 K | 
| Number of distinct elements | 3 | 
| Space group number | 56 | 
| Hermann-Mauguin space group symbol | P c c n | 
| Hall space group symbol | -P 2ab 2ac | 
| Residual factor for all reflections | 0.171 | 
| Residual factor for significantly intense reflections | 0.0572 | 
| Weighted residual factors for significantly intense reflections | 0.1168 | 
| Weighted residual factors for all reflections included in the refinement | 0.1704 | 
| Goodness-of-fit parameter for all reflections included in the refinement | 1.027 | 
| Diffraction radiation wavelength | 0.71073 Å | 
| Diffraction radiation type | MoKα | 
| Has coordinates | Yes | 
| Has disorder | No | 
| Has Fobs | No | 
| Revision | Date | Message | Files | 
|---|---|---|---|
| 173465 (current) | 2016-01-05 | cif/ Adding structures of 4124831 via cif-deposit CGI script.  | 
	4124831.cif | 
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          Users of the data should acknowledge the original authors of the
          structural data.