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Information card for entry 7233752
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| Coordinates | 7233752.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C72 H52 Si |
|---|---|
| Calculated formula | C72 H52 Si |
| Title of publication | Emission enhancement and color adjustment of silicon-cored structure in tetraphenyl benzene with aggregation-enhanced emission |
| Authors of publication | Hua Wang; Yan Liang; Huanling Xie; Linglong Feng; Haifeng Lu; Shengyu Feng |
| Journal of publication | Journal of Materials Chemistry C |
| Year of publication | 2014 |
| Journal volume | 2 |
| Pages of publication | 5601 - 5606 |
| a | 11.607 ± 0.004 Å |
| b | 12.911 ± 0.004 Å |
| c | 19.928 ± 0.007 Å |
| α | 84.703 ± 0.006° |
| β | 79.983 ± 0.006° |
| γ | 64.604 ± 0.006° |
| Cell volume | 2656.1 ± 1.6 Å3 |
| Cell temperature | 273 ± 2 K |
| Ambient diffraction temperature | 273.15 K |
| Number of distinct elements | 3 |
| Space group number | 2 |
| Hermann-Mauguin space group symbol | P -1 |
| Hall space group symbol | -P 1 |
| Residual factor for all reflections | 0.0999 |
| Residual factor for significantly intense reflections | 0.0584 |
| Weighted residual factors for significantly intense reflections | 0.1314 |
| Weighted residual factors for all reflections included in the refinement | 0.156 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.012 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
| Revision | Date | Message | Files |
|---|---|---|---|
| 218140 (current) | 2019-09-10 | cif/ Adding structures of 7233752 via cif-deposit CGI script. |
7233752.cif |
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Users of the data should acknowledge the original authors of the
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