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Information card for entry 7233961
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Coordinates | 7233961.cif |
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Original paper (by DOI) | HTML |
Formula | C6 H18 Cl6 Si6 |
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Calculated formula | C6 H18 Cl6 Si6 |
Title of publication | Soluble polycyclosilane-polysiloxane hybrid material and silicon thin film with optical properties at 193 nm and etch selectivity |
Authors of publication | Sung Jin Park; Hyeon Mo Cho; Myong Euy Lee; Miyoung Kim; Kwenwoo Han; Seunghee Hong; Sanghak Lim; Hansong Lee; Byeonggyu Hwang; Sang Kyun Kim; Sangdeok Shim; Philjae Kang; Moon-Gun Choi |
Journal of publication | Journal of Materials Chemistry C |
Year of publication | 2015 |
Journal volume | 3 |
Pages of publication | 239 - 242 |
a | 17.7183 ± 0.0015 Å |
b | 9.8193 ± 0.0008 Å |
c | 13.5232 ± 0.0012 Å |
α | 90° |
β | 109.717 ± 0.004° |
γ | 90° |
Cell volume | 2214.8 ± 0.3 Å3 |
Cell temperature | 100 K |
Ambient diffraction temperature | 100 K |
Number of distinct elements | 4 |
Space group number | 15 |
Hermann-Mauguin space group symbol | C 1 2/c 1 |
Hall space group symbol | -C 2yc |
Residual factor for all reflections | 0.0555 |
Residual factor for significantly intense reflections | 0.0506 |
Weighted residual factors for significantly intense reflections | 0.1353 |
Weighted residual factors for all reflections included in the refinement | 0.1391 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.143 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | Yes |
Has Fobs | No |
Revision | Date | Message | Files |
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218544 (current) | 2019-09-19 | cif/ Adding structures of 7233961 via cif-deposit CGI script. |
7233961.cif |
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