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Information card for entry 7236150
Preview
| Coordinates | 7236150.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C26 H29 N3 O4 Sn |
|---|---|
| Calculated formula | C26 H29 N3 O4 Sn |
| Title of publication | New application of fluorescent organotin compounds derived from Schiff bases: synthesis, X-ray structures, photophysical properties, cytotoxicity and fluorescent bioimaging |
| Authors of publication | Jiménez-Pérez, Víctor M.; García-López, María C.; Muñoz-Flores, Blanca M.; Chan-Navarro, Rodrigo; Berrones-Reyes, Jessica C.; Dias, H. V. Rasika; Moggio, Ivana; Arias, Eduardo; Serrano-Mireles, Jesús A.; Chavez-Reyes, Arturo |
| Journal of publication | Journal of Materials Chemistry B |
| Year of publication | 2015 |
| Journal volume | 3 |
| Journal issue | 28 |
| Pages of publication | 5731 |
| a | 11.1871 ± 0.0013 Å |
| b | 15.2135 ± 0.0018 Å |
| c | 17.015 ± 0.002 Å |
| α | 109.408 ± 0.001° |
| β | 98.162 ± 0.001° |
| γ | 110.771 ± 0.001° |
| Cell volume | 2440.4 ± 0.5 Å3 |
| Cell temperature | 100 ± 2 K |
| Ambient diffraction temperature | 100.15 K |
| Number of distinct elements | 5 |
| Space group number | 2 |
| Hermann-Mauguin space group symbol | P -1 |
| Hall space group symbol | -P 1 |
| Residual factor for all reflections | 0.052 |
| Residual factor for significantly intense reflections | 0.0407 |
| Weighted residual factors for significantly intense reflections | 0.0976 |
| Weighted residual factors for all reflections included in the refinement | 0.1046 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.039 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
| Revision | Date | Message | Files |
|---|---|---|---|
| 233965 (current) | 2019-11-23 | cif/ Adding structures of 7236147, 7236148, 7236149, 7236150, 7236151 via cif-deposit CGI script. |
7236150.cif |
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Users of the data should acknowledge the original authors of the
structural data.