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Information card for entry 7238460
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| Coordinates | 7238460.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C10 H20 O2 S Si2 |
|---|---|
| Calculated formula | C10 H20 O2 S Si2 |
| Title of publication | 2,5-bis(Arylethynyl)thienyl systems: Preparation and photophysical properties. Part II |
| Authors of publication | Coombs, Benjamin A.; Rutter, Simon R.; Goeta, Andrés E.; Sparkes, Hazel A.; Batsanov, Andrei S.; Beeby, Andrew |
| Journal of publication | RSC Advances |
| Year of publication | 2012 |
| Journal volume | 2 |
| Journal issue | 5 |
| Pages of publication | 1870 |
| a | 15.2943 ± 0.0015 Å |
| b | 15.4858 ± 0.0015 Å |
| c | 6.421 ± 0.0006 Å |
| α | 90° |
| β | 90° |
| γ | 90° |
| Cell volume | 1520.8 ± 0.3 Å3 |
| Cell temperature | 215 ± 2 K |
| Ambient diffraction temperature | 215 ± 2 K |
| Number of distinct elements | 5 |
| Space group number | 59 |
| Hermann-Mauguin space group symbol | P m m n :2 |
| Hall space group symbol | -P 2ab 2a |
| Residual factor for all reflections | 0.0491 |
| Residual factor for significantly intense reflections | 0.0336 |
| Weighted residual factors for significantly intense reflections | 0.0894 |
| Weighted residual factors for all reflections included in the refinement | 0.1033 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.094 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
| Revision | Date | Message | Files |
|---|---|---|---|
| 244182 (current) | 2019-11-28 | cif/ Adding structures of 7238455, 7238456, 7238457, 7238458, 7238459, 7238460 via cif-deposit CGI script. |
7238460.cif |
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Users of the data should acknowledge the original authors of the
structural data.