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Information card for entry 1553616
Preview
| Coordinates | 1553616.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C22 H24 S4 Si2 |
|---|---|
| Calculated formula | C22 H24 S4 Si2 |
| SMILES | s1cc2c3c(c4c(scc4c4c(csc4)c2c1[Si](C)(C)C)[Si](C)(C)C)csc3 |
| Title of publication | Selective deprotonation of tetra[3,4]thienylene in the presence of n-BuLi |
| Authors of publication | Li, Lu; Li, Bingbing; Li, Chunli; Ma, Zhiying; Xu, Li; Wang, Hua |
| Journal of publication | Organic Chemistry Frontiers |
| Year of publication | 2017 |
| Journal volume | 4 |
| Journal issue | 6 |
| Pages of publication | 1019 |
| a | 10.5479 ± 0.0013 Å |
| b | 16.6 ± 0.002 Å |
| c | 13.9079 ± 0.0017 Å |
| α | 90° |
| β | 92.242 ± 0.002° |
| γ | 90° |
| Cell volume | 2433.3 ± 0.5 Å3 |
| Cell temperature | 296 ± 2 K |
| Ambient diffraction temperature | 296 ± 2 K |
| Number of distinct elements | 4 |
| Space group number | 14 |
| Hermann-Mauguin space group symbol | P 1 21/c 1 |
| Hall space group symbol | -P 2ybc |
| Residual factor for all reflections | 0.0597 |
| Residual factor for significantly intense reflections | 0.0447 |
| Weighted residual factors for significantly intense reflections | 0.1207 |
| Weighted residual factors for all reflections included in the refinement | 0.1333 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.046 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
| Revision | Date | Message | Files |
|---|---|---|---|
| 235211 (current) | 2019-11-23 | cif/ Adding structures of 1553616, 1553617 via cif-deposit CGI script. |
1553616.cif |
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