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Information card for entry 1561163
Preview
| Coordinates | 1561163.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | Ca0.68 O5 Si Tm0.32 V |
|---|---|
| Calculated formula | Ca0.6807 O5 Si Tm0.3193 V |
| Title of publication | Facile in-situ reduction: Crystal growth and magnetic studies of reduced vanadium (III/IV) silicates CaxLn1−xVSiO5 (Ln = Ce‒Nd, Sm‒Lu, Y) |
| Authors of publication | Abeysinghe, Dileka; Smith, Mark D.; Morrison, Gregory; Yeon, Jeongho; zur Loye, Hans-Conrad |
| Journal of publication | Journal of Solid State Chemistry |
| Year of publication | 2018 |
| Journal volume | 260 |
| Pages of publication | 80 - 86 |
| a | 6.512 ± 0.0015 Å |
| b | 8.7116 ± 0.0019 Å |
| c | 6.919 ± 0.002 Å |
| α | 90° |
| β | 113.037 ± 0.006° |
| γ | 90° |
| Cell volume | 361.21 ± 0.16 Å3 |
| Cell temperature | 300 ± 2 K |
| Ambient diffraction temperature | 300 ± 2 K |
| Number of distinct elements | 5 |
| Space group number | 15 |
| Hermann-Mauguin space group symbol | C 1 2/c 1 |
| Hall space group symbol | -C 2yc |
| Residual factor for all reflections | 0.0309 |
| Residual factor for significantly intense reflections | 0.0277 |
| Weighted residual factors for significantly intense reflections | 0.057 |
| Weighted residual factors for all reflections included in the refinement | 0.0579 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.308 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
| Revision | Date | Message | Files |
|---|---|---|---|
| 263182 (current) | 2021-03-19 | cif/ Adding structures of 1561163 via cif-deposit CGI script. |
1561163.cif |
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