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Information card for entry 4003025
Preview
| Coordinates | 4003025.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | Bi2 Cl3 Cs3 I6 |
|---|---|
| Calculated formula | Bi2 Cl3 Cs3 I6 |
| SMILES | I[Bi](I)I.[Cl-].[Cs+].[Cs+].I[Bi](I)I.[Cl-].[Cl-].[Cs+] |
| Title of publication | From 0D Cs3Bi2I9 to 2D Cs3Bi2I6Cl3: Dimensional Expansion Induces a Direct Band Gap but Enhances Electron‒Phonon Coupling |
| Authors of publication | McCall, Kyle M.; Stoumpos, Constantinos C.; Kontsevoi, Oleg Y.; Alexander, Grant C. B.; Wessels, Bruce W.; Kanatzidis, Mercouri G. |
| Journal of publication | Chemistry of Materials |
| Year of publication | 2019 |
| Journal volume | 31 |
| Journal issue | 7 |
| Pages of publication | 2644 |
| a | 8.2432 ± 0.0017 Å |
| b | 8.2432 ± 0.0017 Å |
| c | 10.021 ± 0.002 Å |
| α | 90° |
| β | 90° |
| γ | 120° |
| Cell volume | 589.7 ± 0.2 Å3 |
| Cell temperature | 293 ± 2 K |
| Ambient diffraction temperature | 293 ± 2 K |
| Number of distinct elements | 4 |
| Space group number | 164 |
| Hermann-Mauguin space group symbol | P -3 m 1 |
| Hall space group symbol | -P 3 2" |
| Residual factor for all reflections | 0.0459 |
| Residual factor for significantly intense reflections | 0.0426 |
| Weighted residual factors for significantly intense reflections | 0.1206 |
| Weighted residual factors for all reflections included in the refinement | 0.1242 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.16 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
| Revision | Date | Message | Files |
|---|---|---|---|
| 220444 (current) | 2019-10-29 | cif/ Adding structures of 4003025 via cif-deposit CGI script. |
4003025.cif |
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Users of the data should acknowledge the original authors of the
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