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Information card for entry 4124771
Preview
| Coordinates | 4124771.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Common name | ScV2N@Ih(7)-C80/Ni(OEP)/2benzene; |
|---|---|
| Formula | C128.5 H56 N5 Ni Sc V2 |
| Calculated formula | C128.552 H56 N5 Ni Sc V2 |
| Title of publication | Entrapping a Group-VB Transition Metal, Vanadium, within an Endohedral Metallofullerene: VxSc3-xN@Ih-C80 (x = 1, 2). |
| Authors of publication | Wei, Tao; Wang, Song; Lu, Xing; Tan, Yuanzhi; Huang, Jing; Liu, Fupin; Li, Qunxiang; Xie, Suyuan; Yang, Shangfeng |
| Journal of publication | Journal of the American Chemical Society |
| Year of publication | 2016 |
| Journal volume | 138 |
| Journal issue | 1 |
| Pages of publication | 207 - 214 |
| a | 25.2821 ± 0.0015 Å |
| b | 15.1254 ± 0.001 Å |
| c | 19.7824 ± 0.0016 Å |
| α | 90° |
| β | 94.822 ± 0.006° |
| γ | 90° |
| Cell volume | 7538.1 ± 0.9 Å3 |
| Cell temperature | 100 ± 2 K |
| Ambient diffraction temperature | 100.01 ± 0.02 K |
| Number of distinct elements | 6 |
| Space group number | 12 |
| Hermann-Mauguin space group symbol | C 1 2/m 1 |
| Hall space group symbol | -C 2y |
| Residual factor for all reflections | 0.1369 |
| Residual factor for significantly intense reflections | 0.1234 |
| Weighted residual factors for significantly intense reflections | 0.3252 |
| Weighted residual factors for all reflections included in the refinement | 0.3402 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.339 |
| Diffraction radiation wavelength | 1.54184 Å |
| Diffraction radiation type | CuKα |
| Has coordinates | Yes |
| Has disorder | Yes |
| Has Fobs | No |
| Revision | Date | Message | Files |
|---|---|---|---|
| 175789 (current) | 2016-02-04 | cif/ Updating files of 4124770, 4124771 Original log message: Adding full bibliography for 4124770--4124771.cif. |
4124771.cif |
| 171824 | 2016-01-01 | cif/ Adding structures of 4124771 via cif-deposit CGI script. |
4124771.cif |
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Users of the data should acknowledge the original authors of the
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