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Information card for entry 4124828
Preview
| Coordinates | 4124828.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Chemical name | 5,14-di(trimethylsilylethynyl)dibenzo[a,m]rubicene |
|---|---|
| Formula | C44 H34 Si2 |
| Calculated formula | C44 H34 Si2 |
| SMILES | [Si](C)(C)(C)C#Cc1c2ccccc2c2c3c(c4ccccc4c13)c1c3c(c(c4c5c(c2c14)cccc5)C#C[Si](C)(C)C)cccc3 |
| Title of publication | Synthesis, Molecular Packing, and Thin Film Transistors of Dibenzo[a,m]rubicenes. |
| Authors of publication | Gu, Xiao; Xu, Xiaomin; Li, Huiyan; Liu, Zhifeng; Miao, Qian |
| Journal of publication | Journal of the American Chemical Society |
| Year of publication | 2015 |
| Journal volume | 137 |
| Journal issue | 51 |
| Pages of publication | 16203 - 16208 |
| a | 23.848 ± 0.003 Å |
| b | 19.628 ± 0.003 Å |
| c | 7.4604 ± 0.0009 Å |
| α | 90° |
| β | 90° |
| γ | 90° |
| Cell volume | 3492.1 ± 0.8 Å3 |
| Cell temperature | 296 ± 2 K |
| Ambient diffraction temperature | 296 ± 2 K |
| Number of distinct elements | 3 |
| Space group number | 29 |
| Hermann-Mauguin space group symbol | P c a 21 |
| Hall space group symbol | P 2c -2ac |
| Residual factor for all reflections | 0.1532 |
| Residual factor for significantly intense reflections | 0.0673 |
| Weighted residual factors for significantly intense reflections | 0.1331 |
| Weighted residual factors for all reflections included in the refinement | 0.1873 |
| Goodness-of-fit parameter for all reflections included in the refinement | 0.956 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
| Revision | Date | Message | Files |
|---|---|---|---|
| 173462 (current) | 2016-01-05 | cif/ Adding structures of 4124828 via cif-deposit CGI script. |
4124828.cif |
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Users of the data should acknowledge the original authors of the
structural data.