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Information card for entry 4131882
Preview
| Coordinates | 4131882.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C50 H39 F4 Ni P |
|---|---|
| Calculated formula | C50 H39 F4 Ni P |
| SMILES | [Ni]123([P](c4ccccc4)(c4ccccc4)c4ccccc4)C(F)(F)C(F)(F)CCC4(C1([c]12cccc[cH]31)C(=C4c1ccccc1)c1ccccc1)c1ccccc1 |
| Title of publication | Nickel-Catalyzed Formation of 1,3-Dienes via a Highly Selective Cross-Tetramerization of Tetrafluoroethylene, Styrenes, Alkynes, and Ethylene. |
| Authors of publication | Kawashima, Takuya; Ohashi, Masato; Ogoshi, Sensuke |
| Journal of publication | Journal of the American Chemical Society |
| Year of publication | 2017 |
| Journal volume | 139 |
| Journal issue | 49 |
| Pages of publication | 17795 - 17798 |
| a | 10.8594 ± 0.0011 Å |
| b | 19.4976 ± 0.0016 Å |
| c | 37.261 ± 0.003 Å |
| α | 90° |
| β | 96.961 ± 0.002° |
| γ | 90° |
| Cell volume | 7831.2 ± 1.2 Å3 |
| Cell temperature | 123 ± 2 K |
| Ambient diffraction temperature | 123 ± 2 K |
| Number of distinct elements | 5 |
| Space group number | 9 |
| Hermann-Mauguin space group symbol | C 1 c 1 |
| Hall space group symbol | C -2yc |
| Residual factor for all reflections | 0.1206 |
| Residual factor for significantly intense reflections | 0.0733 |
| Weighted residual factors for significantly intense reflections | 0.0941 |
| Weighted residual factors for all reflections included in the refinement | 0.1057 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.006 |
| Diffraction radiation wavelength | 0.71075 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
| Revision | Date | Message | Files |
|---|---|---|---|
| 241976 (current) | 2019-11-25 | cif/ Adding structures of 4131882 via cif-deposit CGI script. |
4131882.cif |
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Users of the data should acknowledge the original authors of the
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