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Information card for entry 4132279
Preview
| Coordinates | 4132279.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C24 H26 N3 O |
|---|---|
| Calculated formula | C24 H26 N3 O |
| SMILES | O=[N]1C(c2c(c3ccc(N)cc3)ccc(c2C1(C)C)c1ccc(N)cc1)(C)C |
| Title of publication | Exploring Applications of Covalent Organic Frameworks: Homogeneous Reticulation of Radicals for Dynamic Nuclear Polarization. |
| Authors of publication | Cao, Wei; Wang, Wei David; Xu, Hai-Sen; Sergeyev, Ivan V.; Struppe, Jochem; Wang, Xiaoling; Mentink-Vigier, Frederic; Gan, Zhehong; Xiao, Ming-Xing; Wang, Lu-Yao; Chen, Guo-Peng; Ding, San-Yuan; Bai, Shi; Wang, Wei |
| Journal of publication | Journal of the American Chemical Society |
| Year of publication | 2018 |
| Journal volume | 140 |
| Journal issue | 22 |
| Pages of publication | 6969 - 6977 |
| a | 17.4658 ± 0.0008 Å |
| b | 17.4658 ± 0.0008 Å |
| c | 15.8447 ± 0.0009 Å |
| α | 90° |
| β | 90° |
| γ | 90° |
| Cell volume | 4833.5 ± 0.4 Å3 |
| Cell temperature | 295.35 ± 0.1 K |
| Ambient diffraction temperature | 295.35 ± 0.1 K |
| Number of distinct elements | 4 |
| Space group number | 82 |
| Hermann-Mauguin space group symbol | I -4 |
| Hall space group symbol | I -4 |
| Residual factor for all reflections | 0.2477 |
| Residual factor for significantly intense reflections | 0.1165 |
| Weighted residual factors for significantly intense reflections | 0.2906 |
| Weighted residual factors for all reflections included in the refinement | 0.3798 |
| Goodness-of-fit parameter for all reflections included in the refinement | 0.958 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
| Revision | Date | Message | Files |
|---|---|---|---|
| 242276 (current) | 2019-11-26 | cif/ Adding structures of 4132279 via cif-deposit CGI script. |
4132279.cif |
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Users of the data should acknowledge the original authors of the
structural data.