Crystallography Open Database

Information card for entry 4135389

Preview

Coordinates	4135389.cif
Original paper (by DOI)	HTML

Structure parameters

Formula	C20 H28 Si3
Calculated formula	C20 H28 Si3
Title of publication	An Electroreductive Approach to Radical Silylation via the Activation of Strong Si-Cl Bond.
Authors of publication	Lu, Lingxiang; Siu, Juno C.; Lai, Yihuan; Lin, Song
Journal of publication	Journal of the American Chemical Society
Year of publication	2020
Journal volume	142
Journal issue	51
Pages of publication	21272 - 21278
a	12.0621 ± 0.0002 Å
b	11.3639 ± 0.0002 Å
c	15.1141 ± 0.0002 Å
α	90°
β	90.006 ± 0.002°
γ	90°
Cell volume	2071.73 ± 0.06 Å³
Cell temperature	103 ± 5 K
Ambient diffraction temperature	103 ± 5 K
Number of distinct elements	3
Space group number	14
Hermann-Mauguin space group symbol	P 1 21/c 1
Hall space group symbol	-P 2ybc
Residual factor for all reflections	0.052
Residual factor for significantly intense reflections	0.0483
Weighted residual factors for significantly intense reflections	0.13
Weighted residual factors for all reflections included in the refinement	0.1328
Goodness-of-fit parameter for all reflections included in the refinement	1.098
Diffraction radiation probe	x-ray
Diffraction radiation wavelength	1.54184 Å
Diffraction radiation type	CuKα
Has coordinates	Yes
Has disorder	No
Has F_obs	No

Version history

Revision	Date	Message	Files
260426 (current)	2021-01-04	cif/ Updating files of 4135389 Original log message: Adding full bibliography for 4135389.cif.	4135389.cif
259720	2020-12-10	cif/ Adding structures of 4135389 via cif-deposit CGI script.	4135389.cif