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Information card for entry 4303186
Preview
Coordinates | 4303186.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C54 H108 Mn2 N8 Na2 |
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Calculated formula | C54 H108 Mn2 N8 Na2 |
SMILES | c1(ccc(cc1)[Mn](N1C(C)(C)CCCC1(C)C)[N]1([Na]2[N](C)(C)CC[N]2(C)C)C(C)(C)CCCC1(C)C)[Mn]([N]1(C(C)(C)CCCC1(C)C)[Na]1[N](C)(C)CC[N]1(C)C)N1C(C)(C)CCCC1(C)C |
Title of publication | Alkali-Metal-Mediated Manganation(II) of Naphthalenes: Constructing Metalla-Anthracene and Metalla-Phenanthrene Structures |
Authors of publication | Victoria L. Blair; William Clegg; Robert E. Mulvey; Luca Russo |
Journal of publication | Inorganic Chemistry |
Year of publication | 2009 |
Journal volume | 48 |
Pages of publication | 8863 - 8870 |
a | 8.333 ± 0.003 Å |
b | 22.027 ± 0.007 Å |
c | 16.32 ± 0.005 Å |
α | 90° |
β | 91.466 ± 0.005° |
γ | 90° |
Cell volume | 2994.6 ± 1.7 Å3 |
Cell temperature | 150 ± 2 K |
Ambient diffraction temperature | 150 ± 2 K |
Number of distinct elements | 5 |
Space group number | 14 |
Hermann-Mauguin space group symbol | P 1 21/n 1 |
Hall space group symbol | -P 2yn |
Residual factor for all reflections | 0.0799 |
Residual factor for significantly intense reflections | 0.077 |
Weighted residual factors for significantly intense reflections | 0.1575 |
Weighted residual factors for all reflections included in the refinement | 0.1584 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.518 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
Revision | Date | Message | Files |
---|---|---|---|
179069 (current) | 2016-03-22 | cif/4/30/ (antanas@kurmis) Replacing _[local]_cod_* tags with their equivalents from the COD CIF dictionary in multiple entries in subrange 4/30/31. |
4303186.cif |
120081 | 2014-07-12 | Adding DOIs to range 4/30 structures. | 4303186.cif |
34330 | 2012-02-24 | cif/4/ Reorganising CIF range 4 into a prefix tree. |
4303186.cif |
1125 | 2010-04-25 | cif/4/ Adding CIFs for the Inorg-Chem-2009_11-24 deposition. |
4303186.cif |
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