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Information card for entry 4349508
Preview
| Coordinates | 4349508.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C20 H20 Cl3 In N2 O7 |
|---|---|
| Calculated formula | C20 H20 Cl3 In N2 O7 |
| SMILES | [In]12(Cl)(Cl)(Cl)([O]=C(O1)c1[nH+]c3c(cc1)cccc3)[O]=C(O2)c1[nH+]c2c(cc1)cccc2.O.O.O |
| Title of publication | Self-assembly of two supramolecular indium(iii) metal‒organic frameworks for reversible iodine capture and large band gap change semiconductor behavior |
| Authors of publication | Du, Xi; Fan, Ruiqing; Fan, Jizhuang; Qiang, Liangsheng; Song, Yang; Dong, Yuwei; Xing, Kai; Wang, Ping; Yang, Yulin |
| Journal of publication | Inorganic Chemistry Frontiers |
| Year of publication | 2016 |
| Journal volume | 3 |
| Journal issue | 11 |
| Pages of publication | 1480 |
| a | 12.6427 ± 0.0013 Å |
| b | 12.643 Å |
| c | 14.7501 ± 0.0016 Å |
| α | 90° |
| β | 90° |
| γ | 90° |
| Cell volume | 2357.7 ± 0.4 Å3 |
| Cell temperature | 296 ± 2 K |
| Ambient diffraction temperature | 296 ± 2 K |
| Number of distinct elements | 6 |
| Space group number | 19 |
| Hermann-Mauguin space group symbol | P 21 21 21 |
| Hall space group symbol | P 2ac 2ab |
| Residual factor for all reflections | 0.0594 |
| Residual factor for significantly intense reflections | 0.0396 |
| Weighted residual factors for significantly intense reflections | 0.0941 |
| Weighted residual factors for all reflections included in the refinement | 0.1169 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.086 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
| Revision | Date | Message | Files |
|---|---|---|---|
| 234838 (current) | 2019-11-23 | cif/ Adding structures of 4349508, 4349509 via cif-deposit CGI script. |
4349508.cif |
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