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Information card for entry 4514604
Preview
| Coordinates | 4514604.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C32 H16 In O5 |
|---|---|
| Calculated formula | C32 H16 In O5 |
| Title of publication | Selective Photooxidation of Amines and Sulfides Triggered by a Superoxide Radical Using a Novel Visible-Light-Responsive Metal-Organic Framework. |
| Authors of publication | Wei, Hongxia; Guo, Zhifen; Liang, Xiao; Chen, Peiqi; Liu, Hui; Xing, Hongzhu |
| Journal of publication | ACS applied materials & interfaces |
| Year of publication | 2019 |
| Journal volume | 11 |
| Journal issue | 3 |
| Pages of publication | 3016 - 3023 |
| a | 7.2183 ± 0.0005 Å |
| b | 43.778 ± 0.003 Å |
| c | 10.9651 ± 0.0008 Å |
| α | 90° |
| β | 93.594 ± 0.003° |
| γ | 90° |
| Cell volume | 3458.2 ± 0.4 Å3 |
| Cell temperature | 296 ± 2 K |
| Ambient diffraction temperature | 296 ± 2 K |
| Number of distinct elements | 4 |
| Space group number | 12 |
| Hermann-Mauguin space group symbol | C 1 2/m 1 |
| Hall space group symbol | -C 2y |
| Residual factor for all reflections | 0.035 |
| Residual factor for significantly intense reflections | 0.0283 |
| Weighted residual factors for significantly intense reflections | 0.0685 |
| Weighted residual factors for all reflections included in the refinement | 0.0715 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.092 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
| Revision | Date | Message | Files |
|---|---|---|---|
| 219789 (current) | 2019-10-28 | cif/ Adding structures of 4514604 via cif-deposit CGI script. |
4514604.cif |
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Users of the data should acknowledge the original authors of the
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