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Information card for entry 7049009
Preview
| Coordinates | 7049009.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C32 H61 Ni P3 Si4 |
|---|---|
| Calculated formula | C32 H61 Ni P3 Si4 |
| Title of publication | Isolation of two bis(silyl)nickel complexes with Si-Si bond formation in a single-crystal-to-single-crystal fashion. |
| Authors of publication | Zhang, Sen-Yu; Li, Jie; Zhao, Sheng-Ze; Wang, Shi; Lu, Min-Ming; Li, Yong-Hua; Huang, Wei |
| Journal of publication | Dalton transactions (Cambridge, England : 2003) |
| Year of publication | 2019 |
| Journal volume | 48 |
| Journal issue | 10 |
| Pages of publication | 3433 - 3439 |
| a | 11.352 ± 0.002 Å |
| b | 21.355 ± 0.004 Å |
| c | 15.654 ± 0.003 Å |
| α | 90° |
| β | 100.59 ± 0.03° |
| γ | 90° |
| Cell volume | 3730.2 ± 1.3 Å3 |
| Cell temperature | 293 ± 2 K |
| Ambient diffraction temperature | 293 ± 2 K |
| Number of distinct elements | 5 |
| Space group number | 14 |
| Hermann-Mauguin space group symbol | P 1 21/n 1 |
| Hall space group symbol | -P 2yn |
| Residual factor for all reflections | 0.0556 |
| Residual factor for significantly intense reflections | 0.0444 |
| Weighted residual factors for significantly intense reflections | 0.1083 |
| Weighted residual factors for all reflections included in the refinement | 0.1118 |
| Goodness-of-fit parameter for all reflections included in the refinement | 0.955 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
| Revision | Date | Message | Files |
|---|---|---|---|
| 223812 (current) | 2019-11-07 | cif/ Updating files of 7049008, 7049009 Original log message: Adding full bibliography for 7049008--7049009.cif. |
7049009.cif |
| 213631 | 2019-02-14 | cif/ Adding structures of 7049008, 7049009 via cif-deposit CGI script. |
7049009.cif |
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Users of the data should acknowledge the original authors of the
structural data.