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Information card for entry 7111692
Preview
Coordinates | 7111692.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C70 H152 Si18 |
---|---|
Calculated formula | C70 H152 Si18 |
SMILES | c1(c(cc(cc1C([Si](C)(C)C)[Si](C)(C)C)C([Si](C)(C)C)([Si](C)(C)C)[Si](C)(C)C)C([Si](C)(C)C)[Si](C)(C)C)/[Si](=[Si](C#C[Si](C)(C)C)/c1c(cc(cc1C([Si](C)(C)C)[Si](C)(C)C)C([Si](C)(C)C)([Si](C)(C)C)[Si](C)(C)C)C([Si](C)(C)C)[Si](C)(C)C)C#C[Si](C)(C)C |
Title of publication | 1,2-Dialkynyldisilenes: silicon analogues of (E)-enediyne |
Authors of publication | Sato, Takahiro; Mizuhata, Yoshiyuki; Tokitoh, Norihiro |
Journal of publication | Chemical Communications |
Year of publication | 2010 |
Journal volume | 46 |
Journal issue | 24 |
Pages of publication | 4402 - 4404 |
a | 13.4469 ± 0.0016 Å |
b | 13.4846 ± 0.0013 Å |
c | 15.106 ± 0.002 Å |
α | 69.666 ± 0.005° |
β | 68.255 ± 0.008° |
γ | 72.742 ± 0.008° |
Cell volume | 2340.9 ± 0.5 Å3 |
Cell temperature | 103 ± 2 K |
Ambient diffraction temperature | 103 ± 2 K |
Number of distinct elements | 3 |
Space group number | 2 |
Hermann-Mauguin space group symbol | P -1 |
Hall space group symbol | -P 1 |
Residual factor for all reflections | 0.0916 |
Residual factor for significantly intense reflections | 0.0706 |
Weighted residual factors for significantly intense reflections | 0.1803 |
Weighted residual factors for all reflections included in the refinement | 0.2022 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.128 |
Diffraction radiation wavelength | 0.71075 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
Revision | Date | Message | Files |
---|---|---|---|
176432 (current) | 2016-02-14 | cif/ (antanas@kurmis) Replacing _[local]_cod_* tags with their equivalents from the COD CIF dictionary in multiple entries. |
7111692.cif |
96738 | 2014-01-29 | cif/ Adding structures of 7111692, 7111693 via cif-deposit CGI script. |
7111692.cif |
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Users of the data should acknowledge the original authors of the
structural data.