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Information card for entry 7223559
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| Coordinates | 7223559.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Chemical name | Tin (IV) siloxanes |
|---|---|
| Formula | C32 H72 O8 Si2 Sn |
| Calculated formula | C32 H72 O8 Si2 Sn |
| SMILES | [Sn](O[Si](OC(C)(C)C)(OC(C)(C)C)OC(C)(C)C)(O[Si](OC(C)(C)C)(OC(C)(C)C)OC(C)(C)C)(C(C)(C)C)C(C)(C)C |
| Title of publication | New Sterically Hindered Tin(IV) Siloxane Precursors to Tinsilicate Materials: Synthesis, Spectral, Structural and Photocatalytic Studies |
| Authors of publication | Mohan, Gopalakrishnan; Nallasamy, Palanisami |
| Journal of publication | RSC Adv. |
| Year of publication | 2015 |
| a | 9.505 ± 0.002 Å |
| b | 16.483 ± 0.004 Å |
| c | 27.196 ± 0.006 Å |
| α | 90° |
| β | 97.697 ± 0.002° |
| γ | 90° |
| Cell volume | 4222.4 ± 1.6 Å3 |
| Cell temperature | 150.15 K |
| Ambient diffraction temperature | 150.15 K |
| Number of distinct elements | 5 |
| Space group number | 14 |
| Hermann-Mauguin space group symbol | P 1 21/n 1 |
| Hall space group symbol | -P 2yn |
| Residual factor for all reflections | 0.0398 |
| Residual factor for significantly intense reflections | 0.0331 |
| Weighted residual factors for significantly intense reflections | 0.0729 |
| Weighted residual factors for all reflections included in the refinement | 0.0758 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.118 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
| Revision | Date | Message | Files |
|---|---|---|---|
| 171626 (current) | 2015-12-19 | cif/ Adding structures of 7223559, 7223560 via cif-deposit CGI script. |
7223559.cif |
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Users of the data should acknowledge the original authors of the
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