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Information card for entry 7233504
Preview
| Coordinates | 7233504.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C52 H50 Cl4 Si3 |
|---|---|
| Calculated formula | C52 H50 Cl4 Si3 |
| Title of publication | How do substituents affect silole emission? |
| Authors of publication | Engui Zhao; Jacky W. Y. Lam; Yuning Hong; Jianzhao Liu; Qian Peng; Jianhua Hao; Herman H. Y. Sung; Ian D. Williams; Ben Zhong Tang |
| Journal of publication | Journal of Materials Chemistry C |
| Year of publication | 2013 |
| Journal volume | 1 |
| Pages of publication | 5661 - 5668 |
| a | 11.2522 ± 0.0002 Å |
| b | 24.9636 ± 0.0004 Å |
| c | 18.4374 ± 0.0004 Å |
| α | 90° |
| β | 104.987 ± 0.002° |
| γ | 90° |
| Cell volume | 5002.82 ± 0.17 Å3 |
| Cell temperature | 173 ± 2 K |
| Ambient diffraction temperature | 173 ± 0.14 K |
| Number of distinct elements | 4 |
| Space group number | 15 |
| Hermann-Mauguin space group symbol | I 1 2/a 1 |
| Hall space group symbol | -I 2ya |
| Residual factor for all reflections | 0.0611 |
| Residual factor for significantly intense reflections | 0.0587 |
| Weighted residual factors for significantly intense reflections | 0.1619 |
| Weighted residual factors for all reflections included in the refinement | 0.1644 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.013 |
| Diffraction radiation probe | x-ray |
| Diffraction radiation wavelength | 1.5418 Å |
| Diffraction radiation type | CuKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
| Revision | Date | Message | Files |
|---|---|---|---|
| 217774 (current) | 2019-08-28 | cif/ Adding structures of 7233504 via cif-deposit CGI script. |
7233504.cif |
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Users of the data should acknowledge the original authors of the
structural data.