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Information card for entry 7234090
Preview
| Coordinates | 7234090.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Common name | DHTA-F2 from solution (200 K) |
|---|---|
| Formula | C40 H50 F2 N4 Si2 |
| Calculated formula | C40 H50 F2 N4 Si2 |
| SMILES | [Si](C#Cc1c2Nc3nc4cc(F)c(F)cc4nc3Nc2c(C#C[Si](C(C)C)(C(C)C)C(C)C)c2ccccc12)(C(C)C)(C(C)C)C(C)C |
| Title of publication | N,N'-Dihydrotetraazapentacenes (DHTA) in thin film transistors |
| Authors of publication | Fabian Paulus; Benjamin D. Lindner; Hilmar Reiss; Frank Rominger; Andreas Leineweber; Yana Vaynzof; Henning Sirringhaus; Uwe H. F. Bunz |
| Journal of publication | Journal of Materials Chemistry C |
| Year of publication | 2015 |
| Journal volume | 3 |
| Pages of publication | 1604 - 1609 |
| a | 16.4266 ± 0.0017 Å |
| b | 39.893 ± 0.004 Å |
| c | 36.045 ± 0.004 Å |
| α | 90° |
| β | 99.223 ± 0.003° |
| γ | 90° |
| Cell volume | 23315 ± 4 Å3 |
| Cell temperature | 200 ± 2 K |
| Ambient diffraction temperature | 200 ± 2 K |
| Number of distinct elements | 5 |
| Space group number | 14 |
| Hermann-Mauguin space group symbol | P 1 21/c 1 |
| Hall space group symbol | -P 2ybc |
| Residual factor for all reflections | 0.1768 |
| Residual factor for significantly intense reflections | 0.0817 |
| Weighted residual factors for significantly intense reflections | 0.178 |
| Weighted residual factors for all reflections included in the refinement | 0.2357 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.009 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
| Revision | Date | Message | Files |
|---|---|---|---|
| 218747 (current) | 2019-09-23 | cif/ Adding structures of 7234090 via cif-deposit CGI script. |
7234090.cif |
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Users of the data should acknowledge the original authors of the
structural data.