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Information card for entry 7244270
Preview
Coordinates | 7244270.cif |
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Original paper (by DOI) | HTML |
Formula | C42 H42.67 Cl2 Cu N10 O8.33 |
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Calculated formula | C42 H42 Cl2 Cu N10 O8.33333 |
SMILES | [Cu]1234([n]5c(cccc5C(=[N]2Nc2ccccc2)C)C(=[N]1Nc1ccccc1)C)[n]1c(cccc1C(=[N]4Nc1ccccc1)C)C(=[N]3Nc1ccccc1)C.Cl(=O)(=O)(=O)[O-].Cl(=O)(=O)(=O)[O-].O |
Title of publication | Multipurpose made colorimetric materials for amines, pH change and metal ion detection |
Authors of publication | Bao, Lihong; Jones, Leighton O.; Garrote Cañas, Ana M.; Yan, Yunhan; Pask, Christopher M.; Hardie, Michaele J.; Mosquera, Martin A.; Schatz, George C.; Sergeeva, Natalia N. |
Journal of publication | RSC Advances |
Year of publication | 2022 |
Journal volume | 12 |
Journal issue | 5 |
Pages of publication | 2684 - 2692 |
a | 17.0485 ± 0.0004 Å |
b | 21.1841 ± 0.0006 Å |
c | 17.4301 ± 0.0005 Å |
α | 90° |
β | 94.546 ± 0.002° |
γ | 90° |
Cell volume | 6275.2 ± 0.3 Å3 |
Cell temperature | 120 ± 0.4 K |
Ambient diffraction temperature | 120 ± 0.4 K |
Number of distinct elements | 6 |
Space group number | 4 |
Hermann-Mauguin space group symbol | P 1 21 1 |
Hall space group symbol | P 2yb |
Residual factor for all reflections | 0.0862 |
Residual factor for significantly intense reflections | 0.0615 |
Weighted residual factors for significantly intense reflections | 0.1443 |
Weighted residual factors for all reflections included in the refinement | 0.1593 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.037 |
Diffraction radiation probe | x-ray |
Diffraction radiation wavelength | 1.54184 Å |
Diffraction radiation type | CuKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
Revision | Date | Message | Files |
---|---|---|---|
272181 (current) | 2022-01-21 | cif/ Adding structures of 7244266, 7244267, 7244268, 7244269, 7244270, 7244271, 7244272, 7244273 via cif-deposit CGI script. |
7244270.cif |
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Users of the data should acknowledge the original authors of the
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