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Information card for entry 7244275
Preview
| Coordinates | 7244275.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C30 H48 Cl9 N3 Sb2 |
|---|---|
| Calculated formula | C30 H48 Cl9 N3 Sb2 |
| SMILES | Cl[Sb]([Cl-])(Cl)Cl.[Sb]([Cl-])(Cl)(Cl)Cl.[N+](C)(C)(Cc1ccccc1)C.[N+](Cc1ccccc1)(C)(C)C.[Cl-].[N+](C)(Cc1ccccc1)(C)C |
| Title of publication | Band gap modulation of organic–inorganic Sb(iii) halide by molecular design |
| Authors of publication | Wang, Yan-Ning; Tong, Liang; Min-Wan,; Liu, Jing-Yuan; Ye, Si-Yu; Mensah, Abraham; Li, Jun-Yi; Chen, Li-Zhuang |
| Journal of publication | CrystEngComm |
| Year of publication | 2022 |
| a | 9.2809 ± 0.0009 Å |
| b | 25.774 ± 0.003 Å |
| c | 17.6172 ± 0.0018 Å |
| α | 90° |
| β | 92.261 ± 0.001° |
| γ | 90° |
| Cell volume | 4210.9 ± 0.8 Å3 |
| Cell temperature | 296 ± 2 K |
| Ambient diffraction temperature | 296.15 K |
| Number of distinct elements | 5 |
| Space group number | 14 |
| Hermann-Mauguin space group symbol | P 1 21/c 1 |
| Hall space group symbol | -P 2ybc |
| Residual factor for all reflections | 0.0576 |
| Residual factor for significantly intense reflections | 0.0485 |
| Weighted residual factors for significantly intense reflections | 0.1448 |
| Weighted residual factors for all reflections included in the refinement | 0.1524 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.065 |
| Diffraction radiation probe | x-ray |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
| Revision | Date | Message | Files |
|---|---|---|---|
| 272214 (current) | 2022-01-25 | cif/ Adding structures of 7244275, 7244276, 7244277, 7244278 via cif-deposit CGI script. |
7244275.cif |
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Users of the data should acknowledge the original authors of the
structural data.