Crystallography Open Database

Information card for entry 7708250

Preview

Coordinates	7708250.cif
Original paper (by DOI)	HTML

Structure parameters

Formula	C20 H56 N4 O2 Si4 Sn2
Calculated formula	C20 H56 N4 O2 Si4 Sn2
SMILES	[Sn]12([N](CC[O]1[Sn]1([N](CC[O]21)(C)C)N([Si](C)(C)C)[Si](C)(C)C)(C)C)N([Si](C)(C)C)[Si](C)(C)C
Title of publication	Evaluation of Sn(II) Aminoalkoxide Precursors for Atomic Layer Deposition of SnO Thin Films. Invitation: Dalton Transactions web collection themed around the topic of tin chemistry
Authors of publication	Johnson, Andrew Lee; Paish, James David; Snook, Michael
Journal of publication	Dalton Transactions
Year of publication	2021
a	8.7579 ± 0.0004 Å
b	8.9319 ± 0.0004 Å
c	23.8923 ± 0.0019 Å
α	80.516 ± 0.005°
β	86.651 ± 0.005°
γ	68.46 ± 0.004°
Cell volume	1714.68 ± 0.18 Å³
Cell temperature	150 ± 2 K
Ambient diffraction temperature	150.01 ± 0.1 K
Number of distinct elements	6
Space group number	2
Hermann-Mauguin space group symbol	P -1
Hall space group symbol	-P 1
Residual factor for all reflections	0.0538
Residual factor for significantly intense reflections	0.0443
Weighted residual factors for significantly intense reflections	0.0877
Weighted residual factors for all reflections included in the refinement	0.0894
Goodness-of-fit parameter for all reflections included in the refinement	1.085
Diffraction radiation probe	x-ray
Diffraction radiation wavelength	0.71073 Å
Diffraction radiation type	MoKα
Has coordinates	Yes
Has disorder	No
Has F_obs	No

Version history

Revision	Date	Message	Files
269053 (current)	2021-09-09	cif/ Adding structures of 7708243, 7708244, 7708245, 7708246, 7708247, 7708248, 7708249, 7708250, 7708251, 7708252, 7708253 via cif-deposit CGI script.	7708250.cif