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Information card for entry 7711410
Preview
| Coordinates | 7711410.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C220 H380 Cu24 N12 O24 Si24 |
|---|---|
| Calculated formula | C220 H380 Cu24 N12 O24 Si24 |
| Title of publication | Cuproussiloxane as two self-assemblies, Cu<sub>20</sub>O<sub>20</sub>Si<sub>10</sub>Me<sub>10</sub>R<sub>10</sub> and Cu<sub>24</sub>O<sub>24</sub>Si<sub>12</sub>Me<sub>12</sub>R<sub>12</sub>, with catalytic property. |
| Authors of publication | Jiang, Wenjun; Wang, Jinjin; Chen, Yilin; Chen, Zhikang; Li, Jiancheng; Jiang, Liuyin; Peng, Yanbo; Zhu, Hongping |
| Journal of publication | Dalton transactions (Cambridge, England : 2003) |
| Year of publication | 2022 |
| Journal volume | 51 |
| Journal issue | 33 |
| Pages of publication | 12432 - 12435 |
| a | 18.463 ± 0.004 Å |
| b | 20.693 ± 0.004 Å |
| c | 23.117 ± 0.005 Å |
| α | 116.54 ± 0.03° |
| β | 99.06 ± 0.03° |
| γ | 102.29 ± 0.03° |
| Cell volume | 7391 ± 4 Å3 |
| Cell temperature | 173 ± 2 K |
| Ambient diffraction temperature | 173.15 K |
| Number of distinct elements | 6 |
| Space group number | 2 |
| Hermann-Mauguin space group symbol | P -1 |
| Hall space group symbol | -P 1 |
| Residual factor for all reflections | 0.1133 |
| Residual factor for significantly intense reflections | 0.0806 |
| Weighted residual factors for significantly intense reflections | 0.2032 |
| Weighted residual factors for all reflections included in the refinement | 0.2234 |
| Goodness-of-fit parameter for all reflections included in the refinement | 0.955 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | Yes |
| Has Fobs | No |
| Revision | Date | Message | Files |
|---|---|---|---|
| 278361 (current) | 2022-10-05 | cif/ Adding structures of 7711410, 7711411, 7711412, 7711413 via cif-deposit CGI script. |
7711410.cif |
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Users of the data should acknowledge the original authors of the
structural data.