Crystallography Open Database

Information card for entry 7711466

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Coordinates	7711466.cif
Original paper (by DOI)	HTML

Structure parameters

Formula	C20 H48 N4 Pb2 Si2
Calculated formula	C20 H48 N4 Pb2 Si2
Title of publication	Atomic layer deposition of PbCl<sub>2</sub>, PbBr<sub>2</sub> and mixed lead halide (Cl, Br, I) PbX<sub><i>n</i></sub>Y<sub>2-<i>n</i></sub> thin films.
Authors of publication	Popov, Georgi; Bačić, Goran; Van Dijck, Charlotte; Junkers, Laura S.; Weiß, Alexander; Mattinen, Miika; Vihervaara, Anton; Chundak, Mykhailo; Jalkanen, Pasi; Mizohata, Kenichiro; Leskelä, Markku; Masuda, Jason D.; Barry, Seán T; Ritala, Mikko; Kemell, Marianna
Journal of publication	Dalton transactions (Cambridge, England : 2003)
Year of publication	2022
Journal volume	51
Journal issue	39
Pages of publication	15142 - 15157
a	10.967 ± 0.003 Å
b	13.051 ± 0.004 Å
c	19.827 ± 0.005 Å
α	90°
β	98.094 ± 0.003°
γ	90°
Cell volume	2809.6 ± 1.4 Å³
Cell temperature	125 ± 2 K
Ambient diffraction temperature	125.07 K
Number of distinct elements	5
Space group number	15
Hermann-Mauguin space group symbol	C 1 2/c 1
Hall space group symbol	-C 2yc
Residual factor for all reflections	0.0326
Residual factor for significantly intense reflections	0.0231
Weighted residual factors for significantly intense reflections	0.0417
Weighted residual factors for all reflections included in the refinement	0.0446
Goodness-of-fit parameter for all reflections included in the refinement	1.005
Diffraction radiation wavelength	0.71073 Å
Diffraction radiation type	MoKα
Has coordinates	Yes
Has disorder	No
Has F_obs	No

Version history

Revision	Date	Message	Files
278539 (current)	2022-10-12	cif/ Adding structures of 7711466 via cif-deposit CGI script.	7711466.cif