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Information card for entry 8000510
Preview
| Coordinates | 8000510.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C333 H398 Ag45 Cl2 O26 S22 |
|---|---|
| Calculated formula | C333 H398 Ag45 Cl2 O26 S22 |
| Title of publication | Anisotropic Evolution of Nanoclusters from Ag40 to Ag45: Halogen- and Defect-Induced Epitaxial Growth in Nanoclusters |
| Authors of publication | Du, Wenjun; Deng, Shiyao; Chen, Shuang; Jin, Shan; Zhen, Yaru; Pei, Yong; Zhu, Manzhou |
| Journal of publication | The Journal of Physical Chemistry Letters |
| Year of publication | 2021 |
| Pages of publication | 6654 - 6660 |
| a | 26.2935 ± 0.0009 Å |
| b | 41.0208 ± 0.0014 Å |
| c | 40.3958 ± 0.0014 Å |
| α | 90° |
| β | 104.188 ± 0.002° |
| γ | 90° |
| Cell volume | 42241 ± 3 Å3 |
| Cell temperature | 296 ± 2 K |
| Ambient diffraction temperature | 296.15 K |
| Number of distinct elements | 6 |
| Space group number | 14 |
| Hermann-Mauguin space group symbol | P 1 21/n 1 |
| Hall space group symbol | -P 2yn |
| Residual factor for all reflections | 0.2274 |
| Residual factor for significantly intense reflections | 0.1249 |
| Weighted residual factors for significantly intense reflections | 0.2797 |
| Weighted residual factors for all reflections included in the refinement | 0.3664 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.054 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
| Revision | Date | Message | Files |
|---|---|---|---|
| 267516 (current) | 2021-07-14 | cif/ Adding structures of 8000510 via cif-deposit CGI script. |
8000510.cif |
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