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Information card for entry 8105899
Preview
| Coordinates | 8105899.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C100 H136 N4 O10 S8 Sn4 |
|---|---|
| Calculated formula | C100 H136 N4 O10 S8 Sn4 |
| Title of publication | Crystal structure of bis[(μ3-oxido)-(μ2-(N,N-diisopropylthiocarbamoylthio) acetato-κ2 O,O′)-((N,N-diisopropylthiocarbamoylthio)acetato-κO)-bis(di-4-methylbenzyl-tin(IV))], C100H136N4O10S8Sn4 |
| Authors of publication | Lee, See Mun; Lo, Kong Mun; Tiekink, Edward R.T. |
| Journal of publication | Zeitschrift für Kristallographie - New Crystal Structures |
| Year of publication | 2019 |
| Journal volume | 234 |
| Journal issue | 5 |
| Pages of publication | 943 - 946 |
| a | 13.7756 ± 0.0004 Å |
| b | 13.9663 ± 0.0005 Å |
| c | 16.6392 ± 0.0005 Å |
| α | 71.501 ± 0.002° |
| β | 73.952 ± 0.002° |
| γ | 63.18 ± 0.002° |
| Cell volume | 2675.49 ± 0.16 Å3 |
| Cell temperature | 296 ± 2 K |
| Ambient diffraction temperature | 296 ± 2 K |
| Number of distinct elements | 6 |
| Space group number | 2 |
| Hermann-Mauguin space group symbol | P -1 |
| Hall space group symbol | -P 1 |
| Residual factor for all reflections | 0.0559 |
| Residual factor for significantly intense reflections | 0.0383 |
| Weighted residual factors for significantly intense reflections | 0.1042 |
| Weighted residual factors for all reflections included in the refinement | 0.1209 |
| Goodness-of-fit parameter for all reflections included in the refinement | 0.998 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
| Revision | Date | Message | Files |
|---|---|---|---|
| 278648 (current) | 2022-10-20 | cif/ Adding structures of 8105899 via cif-deposit CGI script. |
8105899.cif |
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Users of the data should acknowledge the original authors of the
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