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Information card for entry 4002990
Preview
| Coordinates | 4002990.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | Li3.66 P0.33 S4 Si0.67 |
|---|---|
| Calculated formula | Li3.65 P0.33 S4 Si0.67 |
| Title of publication | An Entropically Stabilized Fast-Ion Conductor: Li3.25[Si0.25P0.75]S4 |
| Authors of publication | Zhou, Laidong; Assoud, Abdeljalil; Shyamsunder, Abhinandan; Huq, Ashfia; Zhang, Qiang; Hartmann, Pascal; Kulisch, Joern; Nazar, Linda F. |
| Journal of publication | Chemistry of Materials |
| Year of publication | 2019 |
| Journal volume | 31 |
| Journal issue | 19 |
| Pages of publication | 7801 |
| a | 13.675 ± 0.0018 Å |
| b | 7.7946 ± 0.001 Å |
| c | 6.1411 ± 0.0009 Å |
| α | 90° |
| β | 90° |
| γ | 90° |
| Cell volume | 654.59 ± 0.15 Å3 |
| Cell temperature | 280 ± 2 K |
| Ambient diffraction temperature | 280 ± 2 K |
| Number of distinct elements | 4 |
| Space group number | 62 |
| Hermann-Mauguin space group symbol | P n m a |
| Hall space group symbol | -P 2ac 2n |
| Residual factor for all reflections | 0.0472 |
| Residual factor for significantly intense reflections | 0.0441 |
| Weighted residual factors for significantly intense reflections | 0.1158 |
| Weighted residual factors for all reflections included in the refinement | 0.1185 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.099 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
| Revision | Date | Message | Files |
|---|---|---|---|
| 220414 (current) | 2019-10-29 | cif/ Adding structures of 4002990 via cif-deposit CGI script. |
4002990.cif |
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