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Information card for entry 1545232
Preview
| Coordinates | 1545232.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C38 H41 N O3 Si |
|---|---|
| Calculated formula | C38 H41 N O3 Si |
| SMILES | [Si](OC(=C\C=C)/N1[C@H](C(OC1=O)(c1ccccc1)c1ccccc1)C(C)C)(C(C)(C)C)(c1ccccc1)c1ccccc1 |
| Title of publication | Remote Asymmetric Induction Using Acetate-Type Vinylketene Silyl N,O-Acetals. |
| Authors of publication | Sagawa, Naoya; Sato, Haruka; Hosokawa, Seijiro |
| Journal of publication | Organic letters |
| Year of publication | 2017 |
| Journal volume | 19 |
| Journal issue | 1 |
| Pages of publication | 198 - 201 |
| a | 10.6064 ± 0.0002 Å |
| b | 23.8323 ± 0.0004 Å |
| c | 13.3936 ± 0.0003 Å |
| α | 90° |
| β | 98.0064 ± 0.0012° |
| γ | 90° |
| Cell volume | 3352.57 ± 0.11 Å3 |
| Cell temperature | 173 K |
| Ambient diffraction temperature | 173 K |
| Number of distinct elements | 5 |
| Space group number | 4 |
| Hermann-Mauguin space group symbol | P 1 21 1 |
| Hall space group symbol | P 2yb |
| Residual factor for all reflections | 0.0536 |
| Residual factor for significantly intense reflections | 0.0415 |
| Weighted residual factors for significantly intense reflections | 0.0992 |
| Weighted residual factors for all reflections included in the refinement | 0.1158 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.095 |
| Diffraction radiation wavelength | 1.54187 Å |
| Diffraction radiation type | CuKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
| Revision | Date | Message | Files |
|---|---|---|---|
| 191324 (current) | 2017-02-04 | cif/ Adding structures of 1545232 via cif-deposit CGI script. |
1545232.cif |
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