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Information card for entry 2242322
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| Coordinates | 2242322.cif |
|---|---|
| Structure factors | 2242322.hkl |
| Original IUCr paper | HTML |
| Chemical name | Chlorido(dimethyl sulfoxide-κ<i>O</i>)triphenyltin(IV) |
|---|---|
| Formula | C20 H21 Cl O S Sn |
| Calculated formula | C20 H21 Cl O S Sn |
| SMILES | [Sn](Cl)([O]=S(C)C)(c1ccccc1)(c1ccccc1)c1ccccc1 |
| Title of publication | Monoclinic polymorph of chlorido(dimethyl sulfoxide-κ<i>O</i>)triphenyltin(IV) |
| Authors of publication | Pouye, Serigne Fallou; Cissé, Ibrahima; Diop, Libasse; Ríos-Merino, Francisco Javier; Bernès, Sylvain |
| Journal of publication | Acta Crystallographica Section E |
| Year of publication | 2018 |
| Journal volume | 74 |
| Journal issue | 2 |
| Pages of publication | 163 - 166 |
| a | 8.81934 ± 0.00018 Å |
| b | 15.3698 ± 0.0003 Å |
| c | 15.4209 ± 0.0003 Å |
| α | 90° |
| β | 103.294 ± 0.002° |
| γ | 90° |
| Cell volume | 2034.31 ± 0.07 Å3 |
| Cell temperature | 297 ± 1 K |
| Ambient diffraction temperature | 297 ± 1 K |
| Number of distinct elements | 6 |
| Space group number | 4 |
| Hermann-Mauguin space group symbol | P 1 21 1 |
| Hall space group symbol | P 2yb |
| Residual factor for all reflections | 0.072 |
| Residual factor for significantly intense reflections | 0.038 |
| Weighted residual factors for significantly intense reflections | 0.0697 |
| Weighted residual factors for all reflections included in the refinement | 0.0826 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.036 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | Yes |
| Revision | Date | Message | Files |
|---|---|---|---|
| 205171 (current) | 2018-01-13 | cif/ hkl/ Adding structures of 2242322 via cif-deposit CGI script. |
2242322.cif 2242322.hkl |
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Users of the data should acknowledge the original authors of the
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