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Information card for entry 4127741
Preview
| Coordinates | 4127741.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C45 H58 N4 O Si3 |
|---|---|
| Calculated formula | C45 H58 N4 O Si3 |
| Title of publication | Synthesis of an Isolable Bis(silylene)-Stabilized Silylone and Its Reactivity Toward Small Gaseous Molecules. |
| Authors of publication | Wang, Yuwen; Karni, Miriam; Yao, Shenglai; Kaushansky, Alexander; Apeloig, Yitzhak; Driess, Matthias |
| Journal of publication | Journal of the American Chemical Society |
| Year of publication | 2019 |
| Journal volume | 141 |
| Journal issue | 32 |
| Pages of publication | 12916 - 12927 |
| a | 19.1971 ± 0.0003 Å |
| b | 27.1494 ± 0.0003 Å |
| c | 18.067 ± 0.0003 Å |
| α | 90° |
| β | 110.909 ± 0.002° |
| γ | 90° |
| Cell volume | 8796.3 ± 0.3 Å3 |
| Cell temperature | 150 ± 2 K |
| Ambient diffraction temperature | 150 ± 2 K |
| Number of distinct elements | 5 |
| Space group number | 14 |
| Hermann-Mauguin space group symbol | P 1 21/c 1 |
| Hall space group symbol | -P 2ybc |
| Residual factor for all reflections | 0.0571 |
| Residual factor for significantly intense reflections | 0.0422 |
| Weighted residual factors for significantly intense reflections | 0.1047 |
| Weighted residual factors for all reflections included in the refinement | 0.1171 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.023 |
| Diffraction radiation wavelength | 1.54184 Å |
| Diffraction radiation type | CuKα |
| Has coordinates | Yes |
| Has disorder | Yes |
| Has Fobs | No |
| Revision | Date | Message | Files |
|---|---|---|---|
| 220917 (current) | 2019-11-02 | cif/ Adding structures of 4127739, 4127740, 4127741, 4127742, 4127743, 4127744, 4127745, 4127746 via cif-deposit CGI script. |
4127741.cif |
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Users of the data should acknowledge the original authors of the
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