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Information card for entry 7222016
Preview
| Coordinates | 7222016.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C22 H40 B10 O2 Si2 |
|---|---|
| Calculated formula | C22 H40 B10 O2 Si2 |
| SMILES | [Si](c1ccc(OC)cc1)(C)(C)C[C]1234[BH]567[BH]891[C]1%10%11(C[Si](C)(C)c%12ccc(OC)cc%12)[BH]%1228[BH]283[BH]31%12[BH]1%12%10[BH]59%11[BH]561[BH]23%12[BH]4785 |
| Title of publication | High-yielding and Facile Synthesis of Organosilicon Compounds containing m-Carboranylmethyl Group |
| Authors of publication | Han, Xiaojie; Fei, Huafeng; Liu, Bozheng; Tan, Yongxia; Zhang, Xuezhong; Xie, Zemin; Zhang, Zhijie |
| Journal of publication | RSC Adv. |
| Year of publication | 2015 |
| a | 35.83 ± 0.007 Å |
| b | 12.211 ± 0.002 Å |
| c | 6.5889 ± 0.0013 Å |
| α | 90° |
| β | 90° |
| γ | 90° |
| Cell volume | 2882.8 ± 0.9 Å3 |
| Cell temperature | 173.15 K |
| Ambient diffraction temperature | 173.15 K |
| Number of distinct elements | 5 |
| Space group number | 33 |
| Hermann-Mauguin space group symbol | P n a 21 |
| Hall space group symbol | P 2c -2n |
| Residual factor for all reflections | 0.0491 |
| Residual factor for significantly intense reflections | 0.0457 |
| Weighted residual factors for significantly intense reflections | 0.0993 |
| Weighted residual factors for all reflections included in the refinement | 0.1019 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.063 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
| Revision | Date | Message | Files |
|---|---|---|---|
| 154313 (current) | 2015-09-05 | cif/ Adding structures of 7222016, 7222017 via cif-deposit CGI script. |
7222016.cif |
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Users of the data should acknowledge the original authors of the
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