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Information card for entry 7222017
Preview
| Coordinates | 7222017.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C8 H28 B10 O2 Si2 |
|---|---|
| Calculated formula | C8 H28 B10 O2 Si2 |
| SMILES | [Si](O)(C)(C)C[C]1234[BH]567[BH]891[BH]1%102[C]2%11%12(C[Si](O)(C)C)[BH]%1331[BH]145[BH]347[BH]569[BH]8%102[BH]%1245[BH]%11%1313 |
| Title of publication | High-yielding and Facile Synthesis of Organosilicon Compounds containing m-Carboranylmethyl Group |
| Authors of publication | Han, Xiaojie; Fei, Huafeng; Liu, Bozheng; Tan, Yongxia; Zhang, Xuezhong; Xie, Zemin; Zhang, Zhijie |
| Journal of publication | RSC Adv. |
| Year of publication | 2015 |
| a | 7.1014 ± 0.0018 Å |
| b | 11.404 ± 0.003 Å |
| c | 12.182 ± 0.004 Å |
| α | 108.715 ± 0.003° |
| β | 96.432 ± 0.004° |
| γ | 94.36 ± 0.003° |
| Cell volume | 921.9 ± 0.5 Å3 |
| Cell temperature | 173.15 K |
| Ambient diffraction temperature | 173.15 K |
| Number of distinct elements | 5 |
| Space group number | 2 |
| Hermann-Mauguin space group symbol | P -1 |
| Hall space group symbol | -P 1 |
| Residual factor for all reflections | 0.0404 |
| Residual factor for significantly intense reflections | 0.0389 |
| Weighted residual factors for significantly intense reflections | 0.1072 |
| Weighted residual factors for all reflections included in the refinement | 0.1084 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.08 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
| Revision | Date | Message | Files |
|---|---|---|---|
| 154313 (current) | 2015-09-05 | cif/ Adding structures of 7222016, 7222017 via cif-deposit CGI script. |
7222017.cif |
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Users of the data should acknowledge the original authors of the
structural data.