Crystallography Open Database

Information card for entry 7234590

Preview

Coordinates	7234590.cif
Original paper (by DOI)	HTML

Structure parameters

Formula	C34 H68 O6 P2 Ru
Calculated formula	C34 H68 O6 P2 Ru
SMILES	C(=O)(C(C)C)O[Ru](C#[O])(C#[O])(OC(=O)C(C)C)([P](CCCC)(CCCC)CCCC)[P](CCCC)(CCCC)CCCC
Title of publication	Chemical vapor deposition of ruthenium-based layers by a single-source approach
Authors of publication	Janine Jeschke; Stefan Mockel; Marcus Korb; Tobias Ruffer; Khaybar Assim; Marcel Melzer; Gordon Herwig; Colin Georgi; Stefan E. Schulz; Heinrich Lang
Journal of publication	Journal of Materials Chemistry C
Year of publication	2016
Journal volume	4
Pages of publication	2319 - 2328
a	22.4889 ± 0.0008 Å
b	9.0891 ± 0.0004 Å
c	38.7408 ± 0.0012 Å
α	90°
β	102.185 ± 0.003°
γ	90°
Cell volume	7740.4 ± 0.5 Å³
Cell temperature	109.95 ± 0.1 K
Ambient diffraction temperature	110 K
Number of distinct elements	5
Space group number	15
Hermann-Mauguin space group symbol	I 1 2/a 1
Hall space group symbol	-I 2ya
Residual factor for all reflections	0.0339
Residual factor for significantly intense reflections	0.0272
Weighted residual factors for significantly intense reflections	0.0625
Weighted residual factors for all reflections included in the refinement	0.0652
Goodness-of-fit parameter for all reflections included in the refinement	1.047
Diffraction radiation wavelength	0.71073 Å
Diffraction radiation type	MoKα
Has coordinates	Yes
Has disorder	No
Has F_obs	No

Version history

Revision	Date	Message	Files
219333 (current)	2019-10-14	cif/ Adding structures of 7234589, 7234590, 7234591, 7234592, 7234593 via cif-deposit CGI script.	7234590.cif