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Information card for entry 7234591
Preview
| Coordinates | 7234591.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C32 H64 O8 P2 Ru |
|---|---|
| Calculated formula | C32 H64 O8 P2 Ru |
| Title of publication | Chemical vapor deposition of ruthenium-based layers by a single-source approach |
| Authors of publication | Janine Jeschke; Stefan Mockel; Marcus Korb; Tobias Ruffer; Khaybar Assim; Marcel Melzer; Gordon Herwig; Colin Georgi; Stefan E. Schulz; Heinrich Lang |
| Journal of publication | Journal of Materials Chemistry C |
| Year of publication | 2016 |
| Journal volume | 4 |
| Pages of publication | 2319 - 2328 |
| a | 8.3401 ± 0.0008 Å |
| b | 31.639 ± 0.003 Å |
| c | 15.0063 ± 0.0016 Å |
| α | 90° |
| β | 91.517 ± 0.011° |
| γ | 90° |
| Cell volume | 3958.4 ± 0.7 Å3 |
| Cell temperature | 110 K |
| Ambient diffraction temperature | 110 K |
| Number of distinct elements | 5 |
| Space group number | 15 |
| Hermann-Mauguin space group symbol | C 1 2/c 1 |
| Hall space group symbol | -C 2yc |
| Residual factor for all reflections | 0.0511 |
| Residual factor for significantly intense reflections | 0.0488 |
| Weighted residual factors for significantly intense reflections | 0.1303 |
| Weighted residual factors for all reflections included in the refinement | 0.1343 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.042 |
| Diffraction radiation wavelength | 1.54184 Å |
| Diffraction radiation type | CuKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
| Revision | Date | Message | Files |
|---|---|---|---|
| 219333 (current) | 2019-10-14 | cif/ Adding structures of 7234589, 7234590, 7234591, 7234592, 7234593 via cif-deposit CGI script. |
7234591.cif |
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Users of the data should acknowledge the original authors of the
structural data.