Crystallography Open Database

Information card for entry 7234592

Preview

Coordinates	7234592.cif
Original paper (by DOI)	HTML

Structure parameters

Formula	C30 H54 F6 O6 P2 Ru
Calculated formula	C30 H54 F6 O6 P2 Ru
Title of publication	Chemical vapor deposition of ruthenium-based layers by a single-source approach
Authors of publication	Janine Jeschke; Stefan Mockel; Marcus Korb; Tobias Ruffer; Khaybar Assim; Marcel Melzer; Gordon Herwig; Colin Georgi; Stefan E. Schulz; Heinrich Lang
Journal of publication	Journal of Materials Chemistry C
Year of publication	2016
Journal volume	4
Pages of publication	2319 - 2328
a	18.0972 ± 0.0004 Å
b	14.0559 ± 0.0003 Å
c	15.2263 ± 0.0003 Å
α	90°
β	94.708 ± 0.002°
γ	90°
Cell volume	3860.08 ± 0.14 Å³
Cell temperature	110 K
Ambient diffraction temperature	110 K
Number of distinct elements	6
Space group number	14
Hermann-Mauguin space group symbol	P 1 21/c 1
Hall space group symbol	-P 2ybc
Residual factor for all reflections	0.0489
Residual factor for significantly intense reflections	0.0366
Weighted residual factors for significantly intense reflections	0.0779
Weighted residual factors for all reflections included in the refinement	0.0824
Goodness-of-fit parameter for all reflections included in the refinement	1.023
Diffraction radiation wavelength	0.71073 Å
Diffraction radiation type	MoKα
Has coordinates	Yes
Has disorder	Yes
Has F_obs	No

Version history

Revision	Date	Message	Files
219333 (current)	2019-10-14	cif/ Adding structures of 7234589, 7234590, 7234591, 7234592, 7234593 via cif-deposit CGI script.	7234592.cif